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The World Leader in High Performance Signal Processing Solutions Everywhere “SPICE Compatible Models for Circuit Simulation of ESD Events” Jean-Jacques (J-J) Hajjar,

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Published by , 2016-05-13 20:48:03

IEEE Electron Device Society Colloquium March 20, 2012 ...

The World Leader in High Performance Signal Processing Solutions Everywhere “SPICE Compatible Models for Circuit Simulation of ESD Events” Jean-Jacques (J-J) Hajjar,

The World Leader in High Performance Signal Processing Solutions

“SPICE Compatible
Models for Circuit
Simulation of ESD

Events”

Jean-Jacques (J-J) Hajjar,
Srivatsan Parthasarathy

& Paul Zhou

IEEE Electron Device Society Colloquium
University of Central Florida, Orlando, FL

March 20, 2012

Everywhere

MOTIVATION

Key Drivers: the 3 “S”

 Simulation: Predicting robustness of a particular
design to ESD prior to manufacture.

 Synergy: Synthesize the physical concepts that
describes the ESD event into a self-contained
solution.

 Simplicity: Automate and integrate simulation
flow in a standard circuit simulation
environment.

2 Everywhere

OUTLINE

1) What is ESD?
2) Modeling Objectives & Approach
3) Model Development
4) Circuit Simulation Examples
5) Concluding Remarks

3 Everywhere

OUTLINE

1) What is ESD?
2) Modeling Objectives & Approach
3) Model Development
4) Circuit Simulation Examples
5) Concluding Remarks

4 Everywhere

Definition: What is ESD?

Electro-Static Discharge

Relevance: - Damages IC

- Key “product quality” metric

Customer Return Pareto:

5 Everywhere

What is ESD?

Designing for ESD Robustness: Common Practice
Design cycle:

6 Everywhere

What is ESD?

Designing for ESD Robustness: The benefit of
Simulation
Design cycle:

7 Everywhere

OUTLINE

1) What is ESD?
2) Modeling Objectives & Approach
3) Model Development
4) Circuit Simulation Examples
5) Concluding Remarks

8 Everywhere

Modeling Objectives & Approach

A. Verification

– Pass or Fail Robustness test
– Interaction with Core (or Protected) Circuitry

B. Optimization

– Redundant or insufficient protection?

C. Design Cycle Reduction

– First pass success

D. Simplicity

– Adopted by end-user

9 Everywhere

Modeling Objectives & Approach

Quantify Charge dissipation and Failure

RR R1 R1
Q4 Q5
Q1 Q2
V1 Q3 Q6 VOUT
V2 R4 R3
Everywhere
10 R5 R6

Modeling Objectives & Approach

Device Model Development Characteristics:
ASIIC

● Accurate
● Simple
● Incremental

– Leverage standard device models.

● Integrated

– Compatible with circuit design environment.

● Comprehensive

– Protection as well as protected devices modeled.

11 Everywhere

Modeling Objectives & Approach

ESD Characteristics

A. Electrical:

– Large currents & large voltages
– Short duration: 1-200 ns.

B. Physical Failure:

– Junction damage
– Dielectric/Gate-oxide damage

12 Everywhere

Modeling Objectives & Approach

ESD Characteristics
C. Limited applied stimulus:

– Two common models: HBM & CDM

13 Everywhere

Modeling Objectives & Approach

What to model?

● Focus on region beyond normal operation.
● Determine failure point.

IV DC
(VMAX, IMAX)
STRESS

DEVICE
FAILURE

NORMAL
OPERATION

VOLTAGE →

14 Everywhere

Modeling Objectives & Approach

What to model?

● Focus on region beyond normal operation.
● Determine failure point.

IV DEVICE ESD
FAILURE
AVALANCHE STRESS
CURRENT (VMAX, IMAX)

NORMAL
OPERATION

VOLTAGE →

15 Everywhere

Modeling Objectives & Approach

Measuring DUT Transient Characteristics

Characteristics obtained using a TLP (transmission line pulse)
measurement technique.

_

v

_

i

16 Everywhere
CURRENT →
AVERAGEI →

OUTLINE

1) What is ESD?
2) Modeling Objectives & Approach
3) Model Development
4) Circuit Simulation Examples
5) Concluding Remarks

17 Everywhere

Model Development

What to model?
SiGe Complementary Bipolar Process

Proprietary high performance fully dielectrically isolated
complementary bipolar process with SiGe NPN.

18 Everywhere

Model Development

Incentive for Device Model Development

RR R1 R1

Q4 Q5

V1 Q1 Q2 VOUT

V2 Q6
R3

Q3

R5 R6
R4

19 Everywhere

Model Development

What Devices to Model?
A. Core Devices:

 Bipolar transistors: PNP & NPN
 Diodes
 Passive Devices

B. Protection Devices:

 ESD Diodes

20 Everywhere

Model Development Everywhere

Physical Mechanisms to Model
● Junction Breakdown
● Avalanche Current
● Velocity Saturation
● Kirk Effect
● Resistivity Modulation
● Failure

21

Model Development

Non-Physical Diode-Switch Model

● Verilog-A Implementation: 1.0 Current (A)

– Variable “turn-on” Voltage: Von
– Variable series Resistance: R

0.5 R

Von

01 2 3

Voltage (V)

22 Everywhere

Model Development

ESD Diode Model Current (A)

Current (A) 1.0

0.1 0.5

0.05 `

-1 -0.5 0 0.5 1 -4 -3 -2 -1 0 1
0.05
Voltage (V) Voltage (V)

0.5

Standard operation Operation during
ESD event

23 Everywhere

Model Development

ESD Diode Model

● Sub-circuit consisting of Ideal and Standard diodes.

NON-PHYSICAL STANDARD DIODE
DIODE-SWITCH

I
on V

24 Everywhere

Model Development

Bipolar Breakdown Models

• BVEBO: Emitter-Base junction breakdown with Collector floating.
• BVCBO: Collector-Base junction breakdown with Emitter floating.
• BVCEO: Collector-Emitter breakdown with Base floating.

25 Everywhere

Model Development

Leverage and Integrate with Standard SPICE Model

C

● Start with MEXTRAM model B MEXTRAM

● Add necessary elements to Ci
model high-current/voltage Bi
transient.
Ei

E

26 Everywhere

Model Development

NPN Emitter-Base Breakdown Model

● NPN BVEBO is modeled using: NPN AE=0.35 5.2 m

– Ideal diode: D1 Device Failure
(VM,IM)
– Series resistance: R1
SIMULATION
– DC source: VEBO=BVEBO DATA

● Diode turns on at VEBO

R1 BVEB0
VEBO
D1 Everywhere

27

Model Development

PNP Emitter-Base Breakdown

TLP I-V Characteristics

PNP AE=4 1 10 m POLYSILICON E

200

Device Failure EXT-BASE B
C
150 (VM,IM)
Everywhere
100 r

50

BVEB0

0
0 4 8 12
VOLTAGE (V)

28

Model Development

PNP Emitter-Base Breakdown Model

● A parallel breakdown is PNP AE=4 1 10 m
observed at V>BVEBO
Device Failure PARALLEL
● This breakdown is modeled (VM,IM) (R2)
using:
SIMULATION r
– Ideal diode: D2 DATA

– Series resistance: R2

– DC source: VEBO1=BVEBO1

PRIMARY
(R1)

BVEB0

29 Everywhere

Model Development

NPN Collector-Base Breakdown Model

● BVCBO is modeled using:

– Ideal diode: D2
– Series resistance: R2
– DC source: VCBO=BVCBO

● Diode turns at VCBO

30 Everywhere

CURRENT (mA) Model Development

PNP Collector-Base Breakdown

Pulsed I-V Characteristics

31 Everywhere

Model Development

PNP Collector-Base Breakdown Model

● A Parallel breakdown path is
observed due to the reach-
through between extrinsic-
base/collector.

● Current flows laterally instead of
vertically.

R4 R3

VCBO1 VCBO

D4
D3

32 Everywhere

Model Development

Collector-Emitter Breakdown

● Impact ionization in the base collector depletion region.
● Electron-hole pairs swept into the base and collector respectively.
● Results in forward-biasing the base-emitter base junction.
● Current flow from emitter to collector sustains the avalanching in the

depletion region

NP N

33 EB C Everywhere

Model Development

Collector-Emitter Breakdown Model

● The collector-emitter breakdown characterized by several physical
mechanisms.

● Primary breakdown is due to avalanche.
● Carrier velocity saturation and conductivity modulation are also

observed.

34 Everywhere

Model Development

Using MEXTRAM to Model C B E
Collector-Emitter Breakdown:

CBCO CBEO RE
E1
● Weak avalanche is modelled in RCC QBE IN
MEXTRAM. ISUB RBV IB

● The resulting current will turn-on RBC
the Emitter-Base diode.
B1 B2
● This is sufficient to initiate and IAVL
sustain the breakdown. IBC QBC
C2
● The collector resistance will be RCV
optimized to model the conductivity
modulation. C1

● Velocity saturation is also modelled QSUB
in MEXTRAM.

S

35 Everywhere

Model Development

Collector-Emitter Breakdown Model

NPN PNP

80 NPN AE=1 10 m 80 PNP AE=1 10 m
60
SIMULATION Device Failure Device Failure
DATA (VM,IM)
60 (VM,IM)
CURRENT (mA)
CURRENT (mA)
40 40 r
20 BVCEO 20 BVCEO

0 4 8 12 0
0 VOLTAGE (V) 0 10 20
VOLTAGE (V)
36
Everywhere

Model Development

Bipolar Model for ESD Event Simulations

Ci Ci
D2 CBO
R4 R3 CBO
Model Model

VCBO1 VCBO

VCBO MEXTRAM
MEXTRAM
D3 C
R2 C D4 B
Bi B Bi E
R1 E
D1 D2

VEBO

VEBO VEBO1
R1
D1 EBO R2 EBO
Model Model

Ei Ei
37
Everywhere

Model Development

Failure Metric

● Difficult to Model IV DEVICE
● Empirical formulation FAILURE
AVALANCHE
– Current density CURRENT (VMAX, IMAX)
– Energy dissipation
NORMAL
OPERATION

VOLTAGE →

38 Everywhere

Model Development

● Difficult to Model Failure Metric
● Empirical formulation
MAXIMUM CURRENT (mA) — 100 NS. PULSE
– Current density 300
– Energy dissipation
200
12
100

0
048
EMITTER AREA ( m2)

39 Everywhere

OUTLINE

1) What is ESD?
2) Modeling Objectives & Approach
3) Model Development
4) Circuit Simulation Example
5) Concluding Remarks

40 Everywhere

Circuit Simulation Example

Full-Chip ESD Simulation

● High frequency RF quadrature modulator
● Required to pass 2,000V HBM
● ESD simulation mimics actual HBM testing

41 Everywhere

Circuit Simulation Example

Full-Chip ESD Simulation

The design failed 1,000V HBM when stressed between supply VCC and
the I/O pin (VOUT).

FAILED NPN (Q9: AE=0.35 5.2 m)

42 Everywhere

VOLTAGE (V)Circuit Simulation Example

CURRENT (mA)● The simulation identified NPN Q9 to go into BVCEO and conduct current
before the ESD protection turns on.

VOLTAGE TRANSIENT DURING
HBM STRESS

TLP CHARACTERISTICS OF INDIVIDUAL
NPN TRANSISTOR Q9

43 Everywhere

CURRENT (mA) VOLTAGE (V)Circuit Simulation Example

● Current and Voltage transient of NPN transistor Q9 during HBM stress with
failure region highlighted.

44 Everywhere

Circuit Simulation Example

● XIVA (eXternally-Induced Voltage Alteration) micrograph
● The failure location identified was the output NPN transistor flagged by the

ESD simulator.

45 Everywhere

Circuit Simulation Example

● Fix consists of adding resistor in series with transistor Q9
● Resulting current through transistor Q9 decreases to below failure level.

CURRENT TRANSIENT DURING HBM
STRESS ACROSS TRANSISTOR Q9

Q9: NPN AE=0.35 5.2 m

RR R1 Q9 R CURRENT (mA) 60 ORIGINAL FAILURE
Q1 Q2 Q4 DESIGN
Q3
40

VOUT 20 REVISED
DESIGN

R3

0 1
0 0.2 0.4 0.6 0.8
TIME (10-6 sec.)

46 Everywhere

OUTLINE

1) What is ESD?
2) Modeling Objectives & Approach
3) Model Development
4) Circuit Simulation Example
5) Concluding Remarks

47 Everywhere

SUMMARY

● An enhanced compact bipolar breakdown model was developed for a
SiGe bipolar process.

● The model was built around the industry-standard MEXTRAM compact
bipolar model, enabling SPICE-like circuit simulation.

● The model developed is integrated as part of the standard SPICE-type
circuit simulation environment.

● Simulation accuracy was confirmed using circuit simulation example and
the relevant Failure Analysis techniques.

● Predictive ESD simulation methodology used successfully on over four
dozen designs, over four bipolar process technologies and on various
design complexities.

48 Everywhere

The World Leader in High Performance Signal Processing Solutions

“SPICE Compatible
Models for Circuit
Simulation of ESD

Events”

Jean-Jacques (J-J) Hajjar,
Srivatsan Parthasarathy

& Paul Zhou

IEEE Electron Device Society Colloquium
University of Central Florida, Orlando, FL

March 20, 2012

Everywhere


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